ATHENA provides an easy to use, modular, and extensible platform for simulating ion implantation, diffusion, etching, deposition, lithography, oxidation, and silicidation of semiconductor materials. About Silvaco TCAD Tools ATHENA Process Simulation Framework enables process and integration engineers to develop and optimize semiconductor manufacturing processes. Customers are switching to Silvaco TCAD from other TCAD because they do not have to recalibrate their model coefficients, re-establish their process and device simulation flows developed over many years, or learn new software. “We were able to simulate our existing processes and devices using Silvaco TCAD software without re-calibrating our existing Stanford-based model coefficients.” Silvaco provides advanced TCAD technologies based on the latest physical models for process and device simulation.Ĭustomers of Silvaco TCAD software create leading-edge MOS processes and devices, SOI, power devices, and optical semiconductors for sensors, display panels, LEDs and lasers. “We chose the Silvaco TCAD solution for its broad functionality, reliable performance, experienced, straightforward business model and the clear Stanford-based roadmap for the future”, said C.C.Ĭhen, executive VP, Discrete and Analog Division, for LSC. Silvaco International, a leading vendor of commercial TCAD software, today announced that Lite-On Semiconductor Corporation (LSC), a leading manufacturer of image sensors and discrete power devices, has standardized on the Silvaco TCAD process and device simulation flow to develop its next generation power devices. Using ATHENA With Other SILVACO Software.Simulation exercise using SILVACO. Silvaco software pdf Home Support Download Software Manuals.
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